Teelen XTL-12B Inverted Metallurgical Microscopy

TEELEN Inverted Metallurgical Microscopy XTL-12B uses a limited, far color difference correction system, an internal positioning four-hole converter, and a three-layer mechanical moving platform. The objective magnification of XTL-12B is 10X, 20X, 40X, 50X, suitable for semiconductor silicon wafer inspection, geomaterials analysis, etc.