SHANGGUANG 54X Industrial Inspection Microscope
The SHANGGUANG 54X trinocular industrial inspection microscope can observe the bright and dark fields, epipolarized light and differential interference. The 54X trinocular industrial inspection microscope can be widely used in factories, research institutions, and colleges and universities to monitor and analyze silicon wafers, circuit substrates, cracking exploration, and precision molds.
ShangGuangLiuChang
54X
-
ANYTY 3R-MSA600S Portable Video Microscope 64GB
$ 957.00 -
TEELEN XSP-2CBA Trinocular Biological Microscope Trinocular Head 55mm-75mm
Login -
TEELEN EC630 Microscope Camera
Login -
TEELEN DXS-3 Inverted Biological Microscope
Login -
VARNISING BM-SG15Y Research Fluorescence Microscope Magnification 40X-1000X
$ 27587.00
Introduction
The 54X industrial inspection microscope is equipped with a large range of motion stage, epi-illuminator, flat field infinity long working distance bright/dark field objective, and large field of view eyepieceThe infinity correction optical system, with clear image and good contrast, is developed for the semiconductor industry, silicon wafer manufacturing industry, electronic information industry, and metallurgical industry as an industrial microscopeUse. Used for the observation of light and dark fields, epipolarized light and differential interference, and is widely used in factories, research institutions, and colleges and universities to explore silicon wafers, circuit substrates, cracks, and precision moldsMonitoring and analysis. The microscope is equipped with a trinocular tube, optional camera and photographic equipment, and can be connected to a computer and then equipped with measurement software or metallographic image analysis software, which can become a microcomputerindustrial inspection microscope,
ShangGuangLiuChang 54X Sanmu Industrial Inspection MicroscopeSpecifications
| LIST | VALUE |
|---|---|
| Flat field eyepiece | 10X/Φ25 |
| Segmented eyepiece | Grid value 0.1mm, 10X/φ 20 |
| Infinity long working distance flat field objective (magnification/numerical aperture/working distance) | 5X/0.10/29.4、10X/0.25/16、20X/0.40/10.6、40X/0.60/5.4 |
| Total Magnification | 50X~500X |
| Objective lens converter | Five-hole with DIC, light and dark field jack |
| Focusing system | Coarse fretting coaxial, using rack and pinion transmission mechanism |
| Focusing range | 30Mm, fretting grid value: 0.002mm |
| Double-decked Mobile Platform size | 350×310mm |
| Glass table size | 268×198mm |
| Movement range | 250×250mm |
| Simple polarizing device | The polarizer can be rotated 360 °, and the polarizer and the polarizer can be moved out of the optical path |
| DIC darkfield device | DIC and dark field plug-ins can be removed from the optical path |
| emitter illumination system | With aperture light bar and field of view light bar; halogen lamp 12V100W, adjustable luminance |
| Weight | About 35Kg |
ShangGuangLiuChang 54X Sanmu Industrial Inspection Microscope Packing list
[Note] Because the manufacturer's packaging may be updated or upgraded, the detailed packaging list shall be subject to the latest standard configuration of the manufacturer.
