Inductance-coupled plasma atomic emission spectroscopy (AES) provides a method for the determination of iron, aluminum, calcium, manganese, chromium, titanium, phosphorus, copper, nickel, mg, vanadium, niobium, lead, antimony, zirconium, boron and other elements in ferrosilicon. This standard applies to the accurate determination of the content of each element in ferrosilicon and high-silicon ferrosilicon samples. The specific measurement range is detailed in Table 1. The method excites elements in the sample through Inductance-coupled plasma to measure their emitted Light spectrum to determine the mass fraction of each element and ensure the Reliability and accuracy of the analysis results.