GB/T 41064-2021 "Surface chemical analysis, deep profiling, method for determination of deep profiling sputtering rates in X-Rays photoelectron spectroscopy, Auger electron spectroscopy and secondary ion mass spectrometry by single-layer and multi-layer thin films", specifies the method of measuring the deep profiling sputtering rates in correlation spectroscopy using single-layer and multi-layer thin films, and clarifies the test principle, equipment, steps and data processing. The standard provides a unified specification for accurately obtaining sputtering rates, helping to improve the accuracy and reliability of deep profiling results of surface chemical analysis.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | G04 | ICS | 71.040.40 |
| Release Date | 2021-12-31 00:00:00 | Implementation Date | 2022-07-01 00:00:00 |