This standard specifies a method for the measurement of sputtered thin film surface roughness using Atomic Force Microscope (AFM) for the measurement of sputtered thin film surfaces with an average asperity Ra less than 100nm. The standard provides normative guidance for high-accuracy thin film surface roughness measurement and can also be used as a reference for Miscellaneous non-sputtered thin film surface roughness measurement.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | J04 | ICS | 17.040.20 |
| Release Date | 2014-09-30 00:00:00 | Implementation Date | 2015-04-15 00:00:00 |
