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      GB/T 37049-2018 "Determination of metal impurity content in electronic grade polysilicon" Standard Inductance Coupled Plasma Mass Spectrometry "specifies a method for the determination of metal impurity content such as iron, chromium, nickel, copper, zinc and sodium in electronic grade polysilicon using Inductance Coupled Inductively Coupled Plasma Mass Spectrometer (ICP-MS) (ICP-MS), which is suitable for the content range of less than 5 ng/g. The standard provides an accurate Measuring method for the quality control of electronic grade polysilicon materials.

      This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
      Status Active
      CCS H17 ICS 77.040.30
      Release Date 2018-12-28 00:00:00 Implementation Date 2019-04-01 00:00:00
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