This standard specifies a method for the determination of trace metal impurities in silicon materials for photovoltaic cells by Inductance Coupled Plasma Mass Spectrometer (ICP-MS) (ICP-MS), which is suitable for the determination of iron, chromium, nickel, copper, zinc and other elements. The sample is treated with nitric acid and hydrofluoric acid, and the metal content of the dissolved residue is determined by ICP-MS, which provides a reliable detection method for the quality control of photovoltaic silicon materials.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | H82 | ICS | 29.045 |
| Release Date | 2015-07-03 00:00:00 | Implementation Date | 2016-03-01 00:00:00 |