This standard specifies a method for the determination of trace metal impurity content on the surface of silicon materials for photovoltaic cells by Inductance Coupled Plasma Mass Spectrometer (ICP-MS) (ICP-MS), which is suitable for the detection of sodium, mg, aluminum, potassium and other metal elements. The standard describes in detail the sample processing methods and possible interference factors in the measurement process, providing technical guidance for the quality control of photovoltaic silicon materials.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | H82 | ICS | 29.045 |
| Release Date | 2013-11-12 00:00:00 | Implementation Date | 2014-04-15 00:00:00 |