The GB/T 24582-2009 standard specifies a procedure for the detection of metal impurities on the surface of polysilicon by acid leaching method. Quantitative analysis is performed using Inductance Coupled Plasma Mass Spectrometer (ICP-MS). This method is suitable for the detection of trace contamination of alkali metals, alkaline earth metals, eighth-cycle transition elements (e.g. sodium, potassium, calcium, iron, nickel, copper, zinc) and Miscellaneous elements (e.g. aluminum) on the surface of polysilicon. The sample weight ranges from 25 g to 5000 g, and samples of about 300 g are recommended to ensure detection accuracy. The concentration, composition, temperature and leaching time of the acid have a significant impact on the surface corrosion depth and leaching efficiency. The standard sets a detection limit of 0.01 ng/mL and is suitable for samples of various polysilicon shapes.