This standard describes a method for testing the surface Glossiness of silicon wafers under geometric conditions of 20 °, 60 ° or 85 ° using the light reflection method. It is suitable for Glossiness testing on the surface of silicon wafers such as silicon corrosion wafers, polishing wafers, epitaxial wafers, etc., but not for silicon wafers with graphics on the surface. Glossiness is defined by comparing the reflected luminous flux with the reflected luminous flux of standard black Glass. Light source and reception angle are specified in the standard to ensure accuracy and comparability of results.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | H21 | ICS | 77.040 |
| Release Date | 2023-08-06 00:00:00 | Implementation Date | 2024-03-01 00:00:00 |
