This standard describes in detail the method for measuring the thickness of microstructures in the cross section of functional films using Scanning Electron Microscope (SEM). Optical inspection functional films suitable for single-layer or multi-layer structures with a thickness of not less than 50nm. Accurate measurement of the cross-sectional thickness of the film through grinding, polishing, etching and ultra-thin sectioning of the specimen, combined with calibrated SEM technology.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active | ||
|---|---|---|---|
| CCS | G15 | ICS | 71.080.99 |
| Release Date | 2023-08-06 00:00:00 | Implementation Date | 2024-03-01 00:00:00 |