TEELEN XTL-12B Inverted Metallurgical Microscopy
TEELEN Inverted Metallurgical Microscopy XTL-12B uses a limited, far color difference correction system, an internal positioning four-hole converter, and a three-layer mechanical moving platform. The objective magnification of XTL-12B is 10X, 20X, 40X, 50X, suitable for semiconductor silicon wafer inspection, geomaterials analysis, etc.
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TEELEN XTL-12B Inverted Metallurgical Microscopy
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Instrument Introduction
Using professional metallographic objective lenses and flat-field eyepieces, the image quality is good, the resolution is high, and the observation is comfortable.
Provides superior image quality and a solid and reliable mechanical structure.
The corresponding camera accessories can be selected to collect and save the observation images, and the computer and professional metallographic analysis software images can be used for metallographic image analysis.
It is easy to operate and has complete accessories. It is widely used in teaching and scientific research metallographic analysis, semiconductor silicon wafer detection, address mineral analysis , precision engineering measurement and other fields.
Teelen XTL-12B Inverted Metallurgical MicroscopySpecifications
| LIST | VALUE |
|---|---|
| eyepiece | High eye point large field of view flat field eyepiece PL10X/18mm |
| objective lens | Long working distance flat field color difference professional metallographic objective |
| Total Magnification | 10X、20X、40X、50X |
| converter | Inner positioning four-hole converter |
| stage | Three-layer mechanical moving platform, area 180mmX155mm, right-hand low-hand position control, stroke: 75mm × 40mm; metal stage plate, center hole diameter of φ 12mm |
| lighting system | Reflection Cora lighting, with variable aperture diaphragm and center adjustable field diaphragm, adaptive 90V-240V wide Voltage 6V30W halogen lamp (optional single 3W LED lamp), Light intensity continuously adjustable |
| Focusing system | Low-hand coarse fine-tuning coaxial focusing mechanism, coarse motion 38 mm per turn; fine-tuning Accuracy 2um, with elastic adjustment mechanism |
| observation head | Hinged trinocular, 45 ° tilt, bilateral +/- 5 diopter adjustable, pupil distance adjustment range: 54-75mm, fixed spectral ratio, binocular: trinocular = 80%: 20% |
Teelen XTL-12B Inverted Metallurgical Microscopy Packing list
Instrument host x1 unit, objective lens: 10X/20X/40X/50X each, eyepiece: 10X/18mm eyepiece x1 pair, observation head x1 binocular head, 0.5 times C interface x1, plug-in LED Light source assembly x1, stainless steel round plate x1, color filter rod x2, 6.30 million imagery system x1, imagery software (USB) x1, 3.0USB data transmission cable x1, power cable x1, dust cover x1, manual warranty card x1, computer x1
[Note] Because the manufacturer's packaging may be updated or upgraded, the detailed packaging list shall be subject to the latest standard configuration of the manufacturer.
FAQ
- ActiveGB/T 44268.2-2024
- ActiveGB/T 44268.1-2024
- ActiveGB/T 44276.2-2024
- ActiveGB/T 44276.1-2024
- ActiveGB/T 44293-2024
- ActiveGB/T 43846.1-2024
- ActiveGB/T 43846.2-2024
- ActiveGB/T 43846.3-2024
- ActiveJJF 1914-2011
- ActiveGB/T 13777-2024
- ActiveJB/T 8230.1-1999
- ActiveGB/T 42659-2023
- ActiveGB/T 42886-2023
- ActiveGB/T 9247-2008
- ActiveGB/T 9246-2008
- ActiveGB/T 22064-2008
- AbolishGB/T 22063-2008
- AbolishGB/T 22062-2008
- ActiveGB/T 22061-2008
- ActiveGB/T 22060-2008


XTL-12B





