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        Home> Spin Coater> ChengYue> ChengYue CY-SPC8-F Heated Spinning Coater
        ChengYue CY-SPC8-F Heated Spinning Coater

        Chengyue CY-SPC8-F polytetrafluoride material cavity Spinning Coater + heating baking glue

        Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.

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        SKU: NB045923
        China ChengYue
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          • ChengYue CY-SPC8-F Heated Spinning CoaterOverview

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          CY-SPC8-F
          Heated Spinning Coater
          • Chengyue CY-SPC8-F polytetrafluoride material cavity Spinning Coater + heating baking glue
          Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.

          Introduction

          CY-SPC8-F Spin Coater has been miniaturized and designed, with aluminum alloy structure and PTFE cavity, which is beautiful and solid in appearance. The instrument adopts advanced precision motor, and the speed can reach 10,000 rpm, which effectively guarantees the uniformity of film formation. In addition, this instrument adopts touch screen control, which can preset the homogenization curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase.

          Scope of application

          The Spin Coatercan coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, which are mainly used in photoresist spin coating, biological culture medium production, sol-gel method to make polymer films and other fields.

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          ChengYue CY-SPC8-F Heated Spinning CoaterSpecifications

          LIST VALUE
          Speed range 0~10000rpm
          Acceleration range 100~5000rpm/s
          Rotation speed resolution 1rpm
          single step time 3000s
          Suitable substrate Diameter ≤ 8 inches (200mm)
          Cavity material polytetrafluoride
          Epoxy method Manual glue drop, optional precision syringe pump
          Linear dispersion Linear dispersion 5 segments each, a total of 5 Linear dispersion can be stored
          pumping rate 50L/min
          vacuum pump Dry mechanical pump
          heating temperature RT+~200℃
          Heating part Upper cover heating
          Power supply Voltage AC220V 50/60Hz
          Extraction port φ 8mm quick screw interface
          Human Machine Interface 7 inch high definition LCD touch screen
          Machine Weight 12kg
          Machine size 290*365*260mm

          ChengYue CY-SPC8-F Heated Spinning Coater Packing list

          Host X1, suction cup 10mmx1, suction cup 25mmx1, suction cup 55mmx1, suction cup 100mm x1, oil-free vacuum pump x1, manual X1, certificate X1, warranty card X1

          [Note] Because the manufacturer's packaging may be updated or upgraded, the detailed packaging list shall be subject to the latest standard configuration of the manufacturer.

          FAQ

          [Q]
          I want to apply photoresist to silicon wafers in the lab, what spin coater should I choose?
          [A]
          CY-SPC8-F heating type spin coater is recommended. Rotation speed is 10000 rpm, which can ensure uniform photoresist film formation. It also has heating function, which can control solvent volatilization speed and is suitable for photoresist spin coating process.
          [Q]
          What homogenizing equipment do sol-gel experiments require?
          [A]
          It is recommended to use CY-SPC8-F. Its PTFE cavity is corrosion resistant and suitable for treating chemical solvents. It can preset 5-stage homogeneous Linear dispersion and precisely control the film thickness, which just meets the requirements of sol-gel film production.
          [Q]
          I want to apply photoresist on silicon wafer, need heating function, any recommendations?
          [A]
          Recommended CY-SPC8-F heating type spin coater, its maximum Rotation speed 10000 rpm can ensure uniform film formation, heating temperature up to 200 ℃ suitable for photoresist process, 8 inch capacity compatible with common silicon wafer size, touch screen operation is simple and easy to use.
          [Q]
          What equipment does the laboratory need to make sol-gel films?
          [A]
          CY-SPC8-F spin coater, which uses PTFE cavity corrosion resistance, can preset 5-stage homogeneous Linear dispersion to precisely control the film formation process, heating function helps solvent volatilization and film curing, suitable for sol-gel method Preparation of polymer films.
          [Q]
          What functions should be paid attention to when selecting a spinning coater?
          [A]
          Speed accuracy, heating system and ease of operation are recommended. CY-SPC8-F Rotation speed resolution 1rpm ensures uniform film, upper cover is heated to 200 ° C to meet heat treatment needs, 7 inch touch screen can store 5 Linear dispersion, simplifying the experimental process.
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