Spin Coater

Maximum speed 10,000 rpm, acceleration range 100-5000 rpm/s, using PTFE cavity and high-brightness LCD screen control, support program-controlled homogeneous glue Linear dispersion storage.

Speed range 0~10000rpm, Acceleration 100~5000rpm/s, transparent acrylic cavity design, 7-inch touch screen is easy to operate, and Linear dispersion can be preset.

Miniaturized aluminum alloy structure design, maximum Rotation speed 10000 rpm to ensure film formation uniformity, equipped with 7 inch touch screen can preset 5 segments Linear dispersion, easy to operate and suitable for laboratory use.

Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.

Miniaturized aluminum alloy body with acrylic cavity, up to 10000 rpm speed with program-controlled homogenizing function, support 5-stage Linear dispersion storage, suitable for ≤ 4-inch substrate processing.

The miniaturized design is equipped with 304 stainless steel cavity, the maximum speed is 10,000 rpm, and it supports 5-stage homogeneous Linear dispersion storage, which is suitable for precision coating of substrates with a diameter of ≤ 4 inches.

Speed 0~10000rpm, acceleration 100~5000rpm/s, speed resolution 1rpm, cavity material polytetrafluoride, heating temperature ≤ 200 ℃, temperature control mode AIP intelligent temperature control, glue drop mode manual glue drop, exhaust system Vacuumpump.